Cleaning system and method for dynamic devices in a refinery

Details Cleaning system and method for dynamic devices in a refinery Cleaning system and method for dynamic devices in a refinery

2005-03-29

2005-03-29

Carrillo, Sharidan (Department: 1746)

Cleaning and liquid contact with solids

Processes

Gas or vapor condensation or absorption on work

C134S019000, C134S022100, C134S022110, C134S022120, C134S022140, C134S022150, C134S022180, C134S022190, C134S026000, C134S027000, C134S030000, C134S034000, C134S035000, C134S036000, C134S037000

Reexamination Certificate

active

06872263

ABSTRACT:
Disclosed is a novel process for interior cleaning and by cleaning, removing noxious gas and/or restoring the operating efficiency of organically contaminated hydrocarbon processing dynamic devices in a safe and effective manner and in a very short period of time, without a need to manually enter an unsafe environment and mechanically remove organic contaminants. Used is a formulation of non-aqueous, monocyclic saturated terpene mixed with a non-ionic surfactant package. The terpene-based chemical is injected into the organically contaminated device using a novel process involving high-pressure steam to form a very effective cleaning vapor. The device is activated during the process. The vapor may be optionally directed against the normal-flow direction of the device.

REFERENCES:
patent: 3084076 (1963-04-01), Loucks et al.
patent: 4464189 (1984-08-01), Tedder
patent: 5356482 (1994-10-01), Mehta et al.
patent: 5389156 (1995-02-01), Mehta et al.
patent: 5425814 (1995-06-01), Krajicek et al.
patent: 6017492 (2000-01-01), Hashimoto
patent: 6283133 (2001-09-01), Furuta et al.
patent: 20040102351 (2004-05-01), Jansen et al.

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