Cleaning system and method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

134 11, 134 12, 216 67, 216 37, 438710, 438694, B44C 122, H01L 2100

Patent

active

057700001

ABSTRACT:
An improved cleaning system is provided for removing impurities from a material to be cleaned. The system includes two electrodes, a positive electrode ("anode") on one side, near to or in contact with the material to be cleaned, and a negative collector electrode ("cathode") located at a distance from the second side of the material. The material and the two electrodes are placed into a chamber. The system also includes a medium of conductivity which, when under voltage between anode and cathode, produces the flow of negative charge either as electrons or as negative ions. The chamber may be a vacuum chamber or a chamber filled with an inert gas or other electro-negative gases. The flow of negative charges provides layer of negative charge near the second surface of the material so as to induce the positive impurity ions to move towards the surface. Since a grid electrode is absent, the impure ions are removed unhindered from the material to be cleaned.

REFERENCES:
patent: 4534921 (1985-08-01), Fierkens et al.
patent: 5410122 (1995-04-01), Su et al.

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