Cleaning solution for substrate for semiconductor device and...

Details Cleaning solution for substrate for semiconductor device and... Cleaning solution for substrate for semiconductor device and...

2006-08-08

2009-06-02

Webb, Gregory E (Department: 1796)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C134S001300

Reexamination Certificate

active

07541322

ABSTRACT:
To provide a cleaning solution for a substrate for a semiconductor device capable of removing particle contamination, organic contamination and metal contamination at the same time without corroding the substrate surface, and further having good water rinsability and capable of making the substrate surface highly clean in a short time, and a cleaning method.

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