Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2005-09-27
2005-09-27
Gupta, Yogendra N. (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C510S245000, C510S405000, C510S506000, C134S038000, C134S040000
Reexamination Certificate
active
06949495
ABSTRACT:
A solution for washing away residue, comprising an aqueous solution of a water-soluble high molecular compound in which is dissolved at least one kind of dissolving agent selected from an amine and a fluoride. The washing solution is capable of effectively washing away the residue formed during the production of electronic circuits, is very lowly corrosive to the insulating films, low-dielectric interlayer insulating films and wirings, and offers an advantage of little generating foam.
REFERENCES:
patent: 4252656 (1981-02-01), Liebowitz et al.
patent: 5188675 (1993-02-01), Dormon-Brailsford
patent: 5691288 (1997-11-01), Dhillon
patent: 6211130 (2001-04-01), Josa Pons et al.
Mikami Ichiro
Nonaka Tohru
Suto Mizuki
Tono Seiji
Gupta Yogendra N.
Sherman & Shalloway
Taylor Mertie F.
Tokuyama Corporation
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