Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2005-01-11
2005-01-11
Webb, Gregory (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S175000, C510S255000, C134S002000, C134S042000, C430S331000
Reexamination Certificate
active
06841526
ABSTRACT:
Cleaning solutions for removing photoresist materials and a method of forming underlying layer patterns of semiconductor devices using the same. The cleaning solutions for removing photoresist include a solvent mixture of H2O and an organic solvent, an amine compound, a transition metal-removing material and an alkali metal-removing material, and may further include a hydrazine hydrate.
REFERENCES:
patent: 5496491 (1996-03-01), Ward et al.
patent: 5902780 (1999-05-01), Lee
patent: 6367486 (2002-04-01), Lee et al.
Jung Jae Chang
Lee Geun Su
Shin Ki Soo
Marshall & Gerstein & Borun LLP
Webb Gregory
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