Cleaning solution and cleaning method for mask used in...

Details Cleaning solution and cleaning method for mask used in... Cleaning solution and cleaning method for mask used in...

2006-07-11

2006-07-11

Del Cotto, Gregory R. (Department: 1751)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S034000, C134S042000, C510S163000, C510S166000, C510S175000, C510S499000, C510S500000, C510S506000

Reexamination Certificate

active

07073518

ABSTRACT:
A cleaning solution for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device is provided, the cleaning solution including one type or two or more types of aprotic polar solvent. There is also provided a cleaning method for a mask used in a vacuum vapor deposition step in the production of a low molecular weight organic EL device, wherein cleaning is carried out by immersion or jet flow using the cleaning solution.

REFERENCES:
patent: 2005/0115594 (2005-06-01), Hosoda et al.
patent: 2002-110345 (2002-04-01), None
patent: 2002-305079 (2002-10-01), None
patent: 2002-313564 (2002-10-01), None
patent: 2003-109759 (2003-04-01), None
patent: 2003-257664 (2003-09-01), None

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