Cleaning sheet and method of cleaning substrate processing...

Details Cleaning sheet and method of cleaning substrate processing... Cleaning sheet and method of cleaning substrate processing...

2003-11-10

2010-12-07

Barr, Michael (Department: 1711)

Cleaning and liquid contact with solids

Processes

Using solid work treating agents

C134S042000, C428S040100, C428S343000, C015S104002

Reexamination Certificate

active

07846258

ABSTRACT:
A cleaning sheet comprises a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+and K+are extractable with pure water each in an amount of not greater than 20 ppm, when extracted under boiling at 120° C. for 1 hour, and a pressure-sensitive adhesive layer provided on the other side of the base material, a carrying material with cleaning capacity comprising the aforementioned cleaning sheet laminated on a carrying material with a pressure-sensitive adhesive layer. The present disclosure also relates to a method for cleaning a substrate processing equipment which comprises conveying the aforementioned carrying material with cleaning capacity into the substrate processing equipment.

REFERENCES:
patent: 6277457 (2001-08-01), Onishi et al.
patent: 6618890 (2003-09-01), Muhr-Sweeney
patent: 2002/0042962 (2002-04-01), Willman et al.
patent: 8-88206 (1996-04-01), None
patent: 2001-300436 (2001-10-01), None
patent: 2002-23143 (2002-01-01), None
patent: 2002-214576 (2002-07-01), None
patent: 2002-239476 (2002-08-01), None
patent: 2002-327156 (2002-11-01), None
patent: WO 02/083332 (2002-10-01), None
Communication from Japanese Patent Office dated Jun. 5, 2007.
Communication from Japanese Patent Office (6 pages).

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