Cleaning processing method of a film forming apparatus

Details Cleaning processing method of a film forming apparatus Cleaning processing method of a film forming apparatus

1998-06-17

1999-09-21

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 13, 134 19, 134 21, 134 221, 134 251, 134 254, 134 37, 216 67, 427309, 427534, 427535, 427576, 438905, B08B 500, B05D 304

Patent

active

059548878

ABSTRACT:
Disclosed herein is a cleaning processing method in which an object to be processed is mounted on a susceptor in a process chamber of a CVD apparatus, a TiCl.sub.4 gas, a H.sub.2 gas, and a Ar gas are introduced, a Ti film is formed on a surface of the object to be processed in a region of a plasma generated, the object to be processed is conveyed out of the process chamber, supply of the H.sub.2 gas and the Ar gas is thereafter stopped without generating a plasma, and the TiCl.sub.4 gas is introduced by means of a carrier gas, to remove unnecessary Ti films sticking to the inside of the film forming apparatus.

REFERENCES:
patent: 5508066 (1996-04-01), Akahori
patent: 5514425 (1996-05-01), Ito et al.
patent: 5695831 (1997-12-01), Miyazaki
patent: 5709757 (1998-01-01), Hatano et al.
patent: 5721021 (1998-02-01), Tobe et al.

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