Cleaning of silicon wafers with an aqueous solution of KOH and a

Details Cleaning of silicon wafers with an aqueous solution of KOH and a Cleaning of silicon wafers with an aqueous solution of KOH and a

1988-12-27

1990-10-23

Albrecht, Dennis

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 38, 134 42, 252 791, 252 795, 252156, 252173, 252541, 252545, 252547, 252DIG14, 430327, 430331, B08B 308, C11D 706, C11D 732, C11D 734

Patent

active

049649191

ABSTRACT:
Composition of matter and method of cleaning silicon wafers; the composition of matter is an aqueous solution of potassium hydroxide and a nitrogen-containing compound, preferably tetramethylammonium hydroxide. The wafer is immersed in the solution, rinsed and dried.

REFERENCES:
patent: 3607477 (1971-09-01), Rao
patent: 3765969 (1973-10-01), Kragness
patent: 4113551 (1978-09-01), Bassous
patent: 4129457 (1978-12-01), Basi
patent: 4156619 (1979-05-01), Greisshammer
patent: 4202703 (1980-05-01), Zuber
patent: 4261791 (1981-04-01), Shwartzman
patent: 4264374 (1981-04-01), Beyer
patent: 4276186 (1981-06-01), Bakos
patent: 4430152 (1984-02-01), Okano
patent: 4462188 (1984-07-01), Payne
patent: 4518675 (1985-05-01), Kataoka
patent: 4686002 (1987-08-01), Tasset
patent: 4758368 (1988-07-01), Thompson
patent: 4778532 (1988-10-01), McConnell
patent: 4781764 (1988-11-01), Leenaars
patent: 4828751 (1989-05-01), Kremer
Weiss, A. D., "Wafer Cleaning Update", Semiconductor International, Apr. 1984, p. 82.
Skidmore, K., "Cleaning Techniques for Wafer Surfaces", Semiconductor International, Aug. 1987, 6 pages.
Bowling, R. Allen, "An Analysis of Particle Adhesion on Semiconductor Surfaces", J. Electrochem Soc., Sep. 1985, pp. 2208-2214.

Affiliated with

Also associated with

Rating

Cleaning of silicon wafers with an aqueous solution of KOH and a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning of silicon wafers with an aqueous solution of KOH and a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning of silicon wafers with an aqueous solution of KOH and a will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-764305