Cleaning of polycrystalline silicon for charging into a Czochral

Details Cleaning of polycrystalline silicon for charging into a Czochral Cleaning of polycrystalline silicon for charging into a Czochral

1992-12-23

1995-08-29

Simmons, David A.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 21, 134 11, B08B 700

Patent

active

054456797

ABSTRACT:
A process for cleaning organic contaminants from the surface of polycrystalline silicon. In the process, the surface of the polycrystalline silicon is exposed to an oxidizing medium which directly oxidizes the organic contaminant. The oxidized contaminants are then carried away from the polycrystalline silicon surface.

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Fuji, Manufacture of Field-Effect Transistors, CA 115(20): 221063, 1991, Japan.

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