Cleaning of metallic surfaces with hydrogen under vacuum

Details Cleaning of metallic surfaces with hydrogen under vacuum Cleaning of metallic surfaces with hydrogen under vacuum

1979-10-22

1984-06-05

Smith, William F.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 21, B08B 504

Patent

active

044526423

ABSTRACT:
Molecular hydrogen is caused to flow past a hot filament and then past an article having surfaces which are to be cleaned located in a vacuum chamber, at a pressure such that the mean free path of hydrogen molecules is less than the minimum space between the surfaces to be cleaned and the walls of the container. Some of the hydrogen molecules are converted by the hot filament into hydrogen atoms, which react with contaminants on the surface to be cleaned to form products that can be removed by the flow of gas. Other devices can be used for dissociating hydrogen flowing into the chamber into hydrogen atoms and/or ions. Cleaning is effective even on surfaces facing away from the location where the hydrogen atoms are formed.

REFERENCES:
patent: 2985756 (1961-05-01), Holland
patent: 3868271 (1975-02-01), Poley et al.
Holland, L., "Vacuum Deposition of Films", John Wiley and Sons, Inc., 1956, .Y., pp. 74-83, 86-97.

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