Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Patent
1991-09-16
1992-04-28
Morris, Theodore
Cleaning and liquid contact with solids
Processes
Using solid work treating agents
134 8, 51320, 51321, B08B 700
Patent
active
051085127
ABSTRACT:
The present invention is a process for the cleaning of the inner surfaces of a chemical vapor deposition reactor used in the production of polycrystalline silicon. The process comprises impacting the surfaces to be cleaned with solid carbon dioxide pellets. The carbon dioxide pellets dislodge silicon deposits from the surface of the reactor without damaging the surface of the reactor and without providing a source for contamination of polycrystalline silicon produced in the cleaned reactor. The present process is particularly useful for the cleaning of the inner surfaces of chemical vapor deposition reactors used in the production of semi-conductor grade silicon.
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Bielby Eugene F.
Goffnett David M.
Richardson Mark D.
Boley William F.
Chaudhry Saeed T.
Hemlock Semiconductor Corporation
Morris Theodore
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