Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Patent
1995-12-21
1998-08-25
Beck, Shrive P.
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
427104, 427315, 427477, 427486, 118 72, 118634, 134 30, 134 72, 34 22, B05D 106, B08B 302
Patent
active
RE0358797
ABSTRACT:
The apparatus, system and method utilize sequential sprays of wet, low-temperature steam, and dry, high-temperature steam to clean the exterior of laminated objects as well as to effect volatilization of liquid contaminates trapped between lamina thereof. Water is injected into the conduit through which the low-temperature steam is delivered, so as to produce a desirable concentration of droplets therein. A conveyor moves the laminated objects along a horizontal path through zones in which they are sprayed by the low temperature and high temperature steam, and then through a zone in which they are electrostatically coated with powder.
REFERENCES:
patent: 3660136 (1972-05-01), Guilbault et al.
patent: 3865610 (1975-02-01), Goodridge et al.
patent: 3889015 (1975-06-01), English
patent: 3901185 (1975-08-01), Goodridge et al.
patent: 3904346 (1975-09-01), Shaw et al.
patent: 3921574 (1975-11-01), English
patent: 4391016 (1983-07-01), Kawamura et al.
patent: 4441238 (1984-04-01), Hijuelos et al.
patent: 5051136 (1991-09-01), Tuominen
patent: 5120370 (1992-06-01), Mori et al.
patent: 5137581 (1992-08-01), Takahashi
Castelli Daniel
Donahue John
Gillette Donald J.
Hajek Bedrich
Beck Shrive P.
Dorman Ira S.
Electrostatic Technology, Inc.
Parker Fred J.
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