Cleaning method using ammonium persulphate to remove slurry part

Cleaning and liquid contact with solids – Processes – Using solid work treating agents

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134 32, 134 34, B08B 700

Patent

active

060902140

ABSTRACT:
A chemical mechanical cleaning method utilizes an ammonium persulphate solution with simultaneous mechanical brushing to remove residual slurry particles from copper surfaces. The pH of the solution is selected to electrostatically repel charged slurry particles from the copper surface.

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