Cleaning method, method for fabricating semiconductor device...

Details Cleaning method, method for fabricating semiconductor device... Cleaning method, method for fabricating semiconductor device...

2006-02-14

2006-02-14

Chen, Kin-Chan (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

C438S754000, C438S756000

Reexamination Certificate

active

06998352

ABSTRACT:
A cleaning solution having an oxidation-reduction potential lower than that of pure water and a pH value of 4 or below is used to remove metal contamination, thereby efficiently removing the metal contamination adhered onto a surface of a substrate without damaging an underlayer.

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