Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Patent
1995-05-26
1997-05-27
Bos, Steven
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
423237, 4232451, B01D 5358, B01D 5364, B01D 5372, B01D 5304
Patent
active
056329644
ABSTRACT:
A cleaning method for an exhaust gas containing ammonia, silanes, and organometallic compounds exhausted from a nitride film production step, etc., for producing compound semiconductors.
After removing the silanes and the organometallic compounds from the exhaust gas by contacting the exhaust gas with a cleaning agent comprising soda lime having provided thereon a copper(II) salt, the exhaust gas is contacted with an ammonia decomposition catalyst to decompose ammonia into hydrogen and nitrogen, and undecomposed ammonia in the remaining exhaust gas is then removed by a cleaning agent comprising an inorganic carrier having provided thereon a copper(II) salt, or an active carbon having provided thereon copper sulfate.
REFERENCES:
patent: 1559980 (1925-11-01), Perrott
patent: 4784837 (1988-11-01), Kitayama et al.
patent: 5024823 (1991-06-01), Gokcek
patent: 5290393 (1994-03-01), Nakamura
patent: 5320817 (1994-06-01), Hardwick
Sales Brochure from Messer Griesheim GmbH, "TOXISORB--Safe Disposal of Spent Process Gases", copyright 1990, Dusseldorf, German Federal Republic.
Derwent Abstract--JP#012219, Nipon Pionics, Jan. 21, 1991.
Akita Noboru
Ishii Yasu
Bos Steven
DiMauro Peter T.
Japan Pionics Co., Ltd.
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