Cleaning method, cleaning apparatus and electro optical device

Details Cleaning method, cleaning apparatus and electro optical device Cleaning method, cleaning apparatus and electro optical device

2011-03-29

2011-03-29

Carrillo, Sharidan (Department: 1711)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S001000, C134S002000, C134S022100, C134S022140, C134S022190, C134S034000, C134S036000, C134S042000, C134S902000, C510S175000, C438S745000

Reissue Patent

active

RE042248

ABSTRACT:
A cleaning apparatus of organic substances attached to a vapor-deposition mask for low molecular weight organic EL devices comprises a first stage for treating a vapor-deposition mask with a derivative of pyrrolidone, a second stage for rinsing the vapor-deposition mask with water, and a third stage for rinsing the vapor-deposition mask with flowing water. The cleaning apparatus also comprises a fourth stage for treating the vapor-deposition mask with ethanol, a fifth stage for drying the vapor-deposition mask, and a carrying means that carries the vapor-deposition mask to each stage in sequence. It is desirable to adopt N-methyl-2-pyrrolidone as the derivative of pyrrolidone.

REFERENCES:
patent: 3764384 (1973-10-01), Berni et al.
patent: 4906303 (1990-03-01), Freij
patent: 5399203 (1995-03-01), Ishikawa et al.
patent: 5502978 (1996-04-01), Field
patent: 5698045 (1997-12-01), Walsh et al.
patent: 6068000 (2000-05-01), Tanabe et al.
patent: 6198518 (2001-03-01), Kuga
patent: 6476988 (2002-11-01), Yudasaka
patent: 6617265 (2003-09-01), Tanaka et al.
patent: 6805135 (2004-10-01), Hirota et al.
patent: 6841008 (2005-01-01), Branco et al.
patent: 6878213 (2005-04-01), Rosato et al.
patent: 6988922 (2006-01-01), Iwaki
patent: 7073518 (2006-07-01), Ishikawa et al.
patent: 2001/0001784 (2001-05-01), Leduc et al.
patent: 2002/0066466 (2002-06-01), Tan
patent: 2002/0107158 (2002-08-01), Peters et al.
patent: 2003/0022099 (2003-01-01), Lin et al.
patent: 2003/0116845 (2003-06-01), Bojkov et al.
patent: 2003/0171239 (2003-09-01), Patel et al.
patent: 2005/0115594 (2005-06-01), Hosoda et al.
patent: 07-109494 (1995-04-01), None
patent: 08-244040 (1996-09-01), None
patent: 08-319586 (1996-12-01), None
patent: 2000-282219 (2000-10-01), None
patent: 2002-0033041 (2002-05-01), None
patent: 2003-0030933 (2003-04-01), None
patent: WO99-61573 (1999-12-01), None
patent: WO03/057642 (2003-07-01), None
Communication from Chinese Patent Office (with translation) regarding counterpart application.
Communication from Taiwan Patent Office regarding corresponding application; no date noted.
Communication from Chinese Patent Office (with translation) regarding counterpart application; no date noted.
Communication from Korean Patent Office regarding corresponding application; no date noted.

Affiliated with

Also associated with

Rating

Cleaning method, cleaning apparatus and electro optical device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning method, cleaning apparatus and electro optical device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning method, cleaning apparatus and electro optical device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2654822