Cleaning method and system of semiconductor substrate and produc

Details Cleaning method and system of semiconductor substrate and produc Cleaning method and system of semiconductor substrate and produc

1996-04-01

2000-09-12

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

1341001, 1341023, 134902, B08B 300

Patent

active

06116254&

ABSTRACT:
A cleaning method for a semiconductor substrate is provided. After pure water is supplied to a cleaning tank, a chlorine gas is supplied to the pure water to thereby generate chloride ions, hypochlorite ions, chlorite ions, and chlorate ions in the pure water. Then, a semiconductor substrate is immersed into the pure water containing the chloride ions, hypochlorite ions, chlorite ions, and chlorate ions. The fabrication cost of a semiconductor device and adverse effects on the earth environment can be reduced. The concentration of the dissolved chlorine gas in the pure water is preferably in the range from 0.003 to 0.3% by weight.

Affiliated with

Also associated with

Rating

Cleaning method and system of semiconductor substrate and produc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning method and system of semiconductor substrate and produc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning method and system of semiconductor substrate and produc will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-87066