Cleaning method and apparatus for the same

Details Cleaning method and apparatus for the same Cleaning method and apparatus for the same

1998-08-26

1999-11-16

Warden, Jill

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134902, B08B 300

Patent

active

059839090

ABSTRACT:
An aqueous oxidizing acidic cleaning solution or an aqueous oxidizing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with ozone water. An aqueous reducing acidic cleaning solution or an aqueous reducing alkaline cleaning solution is produced by mixing an acidic or alkaline solution with hydrogen water. Each of these aqueous cleaning solutions has effective cleaning power and the ORP and pH values thereof are separately controlled. Therefore, by selecting an appropriate aqueous cleaning solution according to the types of contaminants adhering to subjects during each manufacturing step, a plurality of types of contaminants can be removed by washing with one type of aqueous cleaning solution.

REFERENCES:
patent: 5599438 (1997-02-01), Shiramizu et al.
patent: 5616221 (1997-04-01), Aoki et al.
patent: 5635053 (1997-06-01), Aoki et al.
patent: 5676760 (1997-10-01), Aoki et al.
Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publications, pp. 48-55, 1993.

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