Abrading – Abrading process – Utilizing fluent abradant
Patent
1993-04-27
1996-06-11
Kisliuk, Bruce M.
Abrading
Abrading process
Utilizing fluent abradant
451 39, 451 91, 451 90, 134 7, B24B 100
Patent
active
055250939
ABSTRACT:
Disclosed is a method and apparatus for the blast cleaning of the surface of an object using solid carbon dioxide pellets as the abrasive projected by a gaseous carbon dioxide propellent. The method and apparatus of this invention subjects a portion of a quantity of liquified carbon dioxide contained within a storage vessel to adiabatic expansion to provide a solid phase carbon dioxide and then compressing or extruding the solid phase carbon dioxide to form a plurality of pellets. Another portion of the liquified carbon dioxide is vaporized to provide a volume of gaseous carbon dioxide at above atmospheric pressure which is then used as a carrier and propellent to project the carbon dioxide pellets against the surface of the object to be cleaned. This invention eliminates the need to use a separate compressed air or nitrogen propellent system for a blast cleaning operation.
REFERENCES:
patent: 4038786 (1977-08-01), Fong
patent: 4389820 (1983-06-01), Fong et al.
patent: 4617064 (1986-10-01), Moore
patent: 4707951 (1987-11-01), Gibot et al.
patent: 4727687 (1988-03-01), Moore
patent: 4744181 (1988-05-01), Moore et al.
patent: 4947592 (1990-08-01), Lloyd et al.
patent: 4977910 (1990-12-01), Miyahara et al.
patent: 5062898 (1991-11-01), McDermott et al.
patent: 5074083 (1991-12-01), Kanno et al.
patent: 5109636 (1992-05-01), Lloyd et al.
patent: 5123207 (1992-06-01), Gillis, Jr. et al.
Kisliuk Bruce M.
Morgan Eileen P.
Westinghouse Electric Corporation
LandOfFree
Cleaning method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Cleaning method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-349529