Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1998-08-13
1999-10-05
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510175, 510505, 510506, 510257, 510500, 510493, C09K 1300, C11D 750
Patent
active
059623853
ABSTRACT:
A cleaning liquid for semiconductor devices comprising 1.0 to 5% by weight of a fluorine compound of the formula R.sub.4 NF, wherein R is a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group, 72 to 80% by weight of an organic solvent soluble in water, and the remaining amount being water. The cleaning liquid can rapidly and completely at a low temperature remove resist residues left remaining after dry etching and ashing in the wiring step in the production of semiconductor integrated circuits, and the cleaning liquid does not corrode wiring materials.
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Aoyama Tetsuo
Hasemi Ryuji
Ikeda Hidetoshi
Maruyama Taketo
Garrett Dawn L.
Gupta Yogendra
Mitsubishi Gas Chemical Company Inc.
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