Cleaning liquid for semiconductor devices

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

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510175, 510505, 510506, 510257, 510500, 510493, C09K 1300, C11D 750

Patent

active

059623853

ABSTRACT:
A cleaning liquid for semiconductor devices comprising 1.0 to 5% by weight of a fluorine compound of the formula R.sub.4 NF, wherein R is a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group, 72 to 80% by weight of an organic solvent soluble in water, and the remaining amount being water. The cleaning liquid can rapidly and completely at a low temperature remove resist residues left remaining after dry etching and ashing in the wiring step in the production of semiconductor integrated circuits, and the cleaning liquid does not corrode wiring materials.

REFERENCES:
patent: 4215005 (1980-07-01), Vander Mey
patent: 5478436 (1995-12-01), Winebarger et al.
patent: 5571447 (1996-11-01), Ward et al.
patent: 5630904 (1997-05-01), Aoyama et al.
patent: 5698503 (1997-12-01), Ward et al.
patent: 5709756 (1998-01-01), Ward et al.

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