Cleaning liquid for semiconductor device and cleaning method

Details Cleaning liquid for semiconductor device and cleaning method Cleaning liquid for semiconductor device and cleaning method

2011-02-15

2011-02-15

Choi, Ling-Siu (Department: 1762)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S134000, C510S176000, C510S435000

Reexamination Certificate

active

07888300

ABSTRACT:
The invention provides a cleaning liquid for semiconductor devices which is capable of removing deposits on a surface of an object to be cleaned including a photoresist, an antireflective film, an etching residue and an ashing residue at a low temperature in a short period of time with reduced environmental burdens and without causing corrosion of an interlayer dielectric film, a metal, a metal nitride, and an alloy in the object to be cleaned. The cleaning liquid for semiconductor devices according to the invention contains a reducing agent and a surfactant and has a pH of 10 to 14.

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