Cleaning liquid and cleaning method using the same

Details Cleaning liquid and cleaning method using the same Cleaning liquid and cleaning method using the same

2007-09-11

2010-12-14

Webb, Gregory E (Department: 1796)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C134S001300

Reexamination Certificate

active

07851426

ABSTRACT:
A cleaning liquid used in cleaning of a substrate for use in semiconductor devices conducted after chemical mechanical polishing in manufacture of semiconductor devices, comprising a polycarboxylic acid, an anionic surfactant having an aromatic ring structure in a molecule, a polymer compound having an acidic group on a side chain, and a low molecular weight polyethylene glycol, at the cleaning liquid having a pH of 5 or less, as well as a method of cleaning using the same.

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patent: 2003-289060 (2003-10-01), None
patent: 2005-260213 (2005-09-01), None

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