Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
1999-11-23
2002-07-23
Gupta, Yogendra N. (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S218000, C134S002000, C134S026000
Reexamination Certificate
active
06423675
ABSTRACT:
FIELD OF THE INVENTION
This invention is directed to a composition employable in a cleaning-in-place (CIP) system. More particularly, the invention is directed to a CIP composition that cleans, disinfects or both without requiring the use of a detergent. Also, described herein is a method for using such a CIP composition.
BACKGROUND OF THE INVENTION
It is extremely important to clean food processing facilities like breweries, dairy plants and carbonated beverage plants. Typically, such food processing facilities are cleaned by subjecting the internal or external portions of the machines that make up the facilities to a solution that reacts with the various soils present within the machines.
A conventional CIP system, for example, has several storage containers. Each storage container, independently, houses a solution (e.g., pre-rinse solution, cleaning solution, post-rinse solution) that is fed (non-simultaneously) into the facility targeted for cleaning or decontamination. Often, the solutions are pumped into the gas and liquid passages of the machines in the facilities being cleaned and then circulated through the system until they are finally discharged to waste.
Typical CIP systems are known to employ chlorine. However, chlorine is not environmentally friendly and can form by-products with many organic substances found in the facilities being cleaned. These by-products are not desired and can be carcinogenic materials. Also, chlorine may result in carcinogenic by-products in, for example, the waste sites it is finally discharged to. Other CIP systems are known to use active agents like hydrogen peroxide and peracetic acid. Such systems, however, require high levels of the active agents making their uses non-feasible, for example, from an economic standpoint. Furthermore, agents like peracetic acid tend to have a very pungent aroma.
It is of increasing interest to prepare a CIP composition that is environmentally friendly and economical to use. This invention, therefore, is directed to a CIP composition that does not result in the generation of environmentally unfriendly by-products and that unexpectedly does not require the use of a detergent to demonstrate superior cleaning properties. This invention is also directed to a method for using the CIP composition in a food processing facility.
BACKGROUND REFERENCES
Efforts have been disclosed for cleaning processing equipment. In U.S. Pat. No. 5,888,311, a process for cleaning equipment in the absence of a pre-rinse step is described.
Other efforts have been disclosed for cleaning equipment. In U.S. Pat. No. 5,533,552, a CIP process comprising the step of circulating a cleaning liquid throughout equipment targeted for cleaning is described.
Still other efforts have been described for cleaning equipment. In U.S. Pat. No. 5,064,561, a two part CIP system is described and the system utilizes an alkaline material and an enzyme.
SUMMARY OF THE INVENTION
In a first embodiment, this invention is directed to a CIP composition comprising a halogen dioxide, wherein the halogen dioxide is derived from a precursor alkali metal halite or alkaline earth metal halite, or both.
In a second embodiment, this invention is directed to a method for cleaning or disinfecting processing equipment with the CIP composition described in the first embodiment of this invention.
In a third embodiment, this invention is directed to a method for cleaning and disinfecting processing equipment with the CIP composition described in the first embodiment of this invention.
In a fourth embodiment, this invention is directed to processing equipment comprising, internally, the CIP composition of this invention or processing equipment coated with the CIP composition of this invention, or both.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
Regarding the halogen dioxide used in the CIP composition of this invention, such a compound preferably comprises fluorine, and most preferably, comprises chlorine, with chlorine dioxide being especially preferred. The halogen dioxide is typically prepared by subjecting an alkali metal halite to an acid, like sulfuric acid.
Preferably however, the halogen dioxide is prepared by mixing a precursor with water and supplying current. The precursor added to the water is preferably an alkali metal halite, an alkaline earth metal halite, or both. The amount of precursor added to the water is generally from about 1.0% to about 30.0%, and preferably, from about 2.0% to about 20.0%, and most preferably, from about 3.0% to about 7.0% by weight precursor, based on total weight of precursor and water, including all ranges subsumed therein.
The water that is mixed with the precursor may be tap water and is preferably soft water. The soft water preferably comprises substantially no calcium, magnesium and iron, and does comprise from about 10 ppm to about 5000 ppm, and preferably, from about 15 ppm to about 1000 ppm, and most preferably, from about 50 ppm to about 500 ppm sodium, based on total parts of the sodium and soft water, including all ranges subsumed therein.
The CIP composition of this invention is typically produced by any conventional techniques capable of generating a halogen dioxide. Preferably, however, the CIP composition is produced in a commercially available halogen dioxide generator such as those sold under the name of OXYCHLORe- by International Dioxcide. This method is desired because it allows for the generation of halogen dioxide without requiring the addition of an acid. When preparing the composition, the precursor (e.g., Sodium Chlorite) and soft water solution reacts with electricity yielding the following reaction (composition):
2NaClO
2
+2H
2
O→ClO
2
+2NaOH+H
2
.
The resulting composition is an illustrative example of the CIP composition which may be used in this invention. The preferred precursor solution is anthium dioxide and made commercially available from International Dioxcide.
The amount of current supplied is limited only to the extent that halogen dioxide may be produced. Often, however, a 110 volt alternating current system is used whereby the system tends to deliver from about 10 to 20 amps of current.
When preparing the CIP composition of this invention, temperature and pressure may be maintained at any level that results in halogen dioxide generation. Preferably, however, the temperature is ambient and the pressure is atmospheric.
It is noted herein that the CIP composition of this invention unexpectedly displays both detergent and disinfectant properties when maintained in the pH range from about 6.0 to about 8.0. When superior cleaning properties are desired, the composition is maintained at a pH from about 7.0 to about 14.0, and preferably, from about 7.2 to about 13.0, and most preferably, from about 8.0 to about 10.0, including all ranges subsumed therein. When superior disinfectant properties are desired, the composition is maintained at a pH from about 1.0 to about 6.9, and preferably, from about 2.0 to about 6.0, and most preferably, from about 4.5 to about 5.5, including all ranges subsumed therein. Surprisingly, superior cleaning properties are obtained in the absence of a detergent. Superior cleaning and superior disinfectant properties are defined by the data present in the tables below.
The pH of the CIP composition of this invention may be modified by optionally adding acids, bases and/or employing buffers. Such acids include sulfuric and phosphoric acid. The bases include sodium, potassium and lithium hydroxide and the buffers include bicarbonate, carbonate and bicarbonate/carbonate buffers and borax. The amount of pH modifiers that may be used is limited only to the extent that the desired pH is obtained. As to the buffers, the amount added is enough to keep the CIP composition of this invention substantially stable. Regarding the bases, such bases may be generated directly within the process for synthesizing the halogen dioxide. This is often the case when the Oxychlor e-generator is used wherein the base (e.g., NaOH) may remain in the CIP composition or be drawn
Cole David Christopher
Coughlin Michael Francis
Crawford Charles Allen
Diversey Lever Inc.
Gupta Yogendra N.
Petauncio John M
Squillante, Jr. Edward A.
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