Cleaning fluid for semiconductor substrate

Details Cleaning fluid for semiconductor substrate Cleaning fluid for semiconductor substrate

1993-03-10

1998-01-06

Breneman, R. Bruce

Compositions

Etching or brightening compositions

252 792, 252 793, 252 794, 252 795, H01L 21304, H01L 21306

Patent

active

057050899

ABSTRACT:
An acidic or basic hydrogen peroxide cleaning fluid for cleaning a semiconductor substrate, comprising a phosphonic acid chelating agent and a wetting agent, or comprising a wetting agent alone.

REFERENCES:
patent: 5290361 (1994-03-01), Hayashida et al.
patent: 5302311 (1994-04-01), Sugihara et al.
Patent Abstracts of Japan vol. 14 No. 131 (C-700)1990 & JP-A-20 04 991 (Kita Kazuo).
Database WPIL Week 9251, Derwent Publications Ltd., London, GB; AN 92-422641 & SU-A-1 708 976 (MOSC Textile INST) 30 Jan. 1992.

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