Cleaning evaluation method for a substrate

Measuring and testing – Surface and cutting edge testing

Reexamination Certificate

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Details

C438S014000

Reexamination Certificate

active

10932083

ABSTRACT:
The present invention relates to a cleaning evaluation method for evaluating a surface cleanliness of a substrate which has been cleaned after being polished. This method includes preparing a dummy substrate having a metal film formed on a surface thereof and a monitor substrate on which a cleaning evaluation is performed, and polishing the dummy substrate. After polishing the dummy substrate, the monitor substrate is polished without dressing a polishing surface of a polishing table, the monitor substrate is cleaned, and the surface cleanliness of the monitor substrate which has been cleaned is evaluated.

REFERENCES:
patent: 5626681 (1997-05-01), Nakano et al.
patent: 6614050 (2003-09-01), Yamada et al.
patent: 6849548 (2005-02-01), Cooper
patent: 6899592 (2005-05-01), Kojima et al.
patent: 2002/0142617 (2002-10-01), Stanton
patent: 2004/0063227 (2004-04-01), Suzuki et al.
patent: 5-291225 (1993-11-01), None
patent: 2000-51796 (2000-02-01), None

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