Cleaning evaluation method for a substrate

Details Cleaning evaluation method for a substrate Cleaning evaluation method for a substrate

2007-01-02

2007-01-02

Larkin, Daniel S. (Department: 2856)

Measuring and testing

Surface and cutting edge testing

C438S014000

Reexamination Certificate

active

10932083

ABSTRACT:
The present invention relates to a cleaning evaluation method for evaluating a surface cleanliness of a substrate which has been cleaned after being polished. This method includes preparing a dummy substrate having a metal film formed on a surface thereof and a monitor substrate on which a cleaning evaluation is performed, and polishing the dummy substrate. After polishing the dummy substrate, the monitor substrate is polished without dressing a polishing surface of a polishing table, the monitor substrate is cleaned, and the surface cleanliness of the monitor substrate which has been cleaned is evaluated.

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patent: 5-291225 (1993-11-01), None
patent: 2000-51796 (2000-02-01), None

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