Cleaning equipment for semiconductor substrates

Details Cleaning equipment for semiconductor substrates Cleaning equipment for semiconductor substrates

1998-05-12

1999-11-09

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

134108, 1341021, 134902, B08B 304

Patent

active

059794747

ABSTRACT:
A cleaning equipment for semiconductor substrates, which includes a cleaning tank 2 for cleaning the semiconductor substrates and a circulation filtering device, wherein the cleaning equipment has a pump 6 and a filter unit 7 disposed in a filtering line for cleaning impurities contained in a cleaning liquid, a gas mixing device 8 having a temperature-adjusting function and which is disposed downstream of the pump 6 and the filter unit 7 for adjusting a temperature of the cleaning liquid and dissolving the gas into the cleaning liquid, and a gas-separating device 9 which is disposed downstream of the gas mixing device 8 for separating an undissolved portion of the mixed gas from the cleaning liquid.

REFERENCES:
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patent: 5326035 (1994-07-01), Ohmi et al.
patent: 5415191 (1995-05-01), Mashimo et al.
patent: 5447640 (1995-09-01), Omi et al.
patent: 5681396 (1997-10-01), Madanshetty
patent: 5776296 (1998-07-01), Matthews
patent: 5800626 (1998-09-01), Cohen et al.
patent: 5849091 (1998-12-01), Skrovan et al.

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