Cleaning device for semiconductor wafers

Details Cleaning device for semiconductor wafers Cleaning device for semiconductor wafers

1991-01-22

1992-07-14

Kisliuk, Bruce M.

Abrasive tool making process, material, or composition

With carbohydrate or reaction product thereof

51419, 51424, 51321, B24C 312

Patent

active

051291983

ABSTRACT:
A cleaning device for semiconductor wafers includes a cleaning vessel, a frozen particle supply unit, a jet nozzle for ejecting the frozen particles toward the semiconductor wafer supported within the cleaning vessel, an exhaust duct coupled to the cleaning vessel, and an exhaust blower. First and second exhausts guide to the exhaust duct frozen particles and contaminants from within the cleaning vessel near the wafer and near the walls of the vessel, respectively. The first exhaust includes a first exhaust guide pipe whose upper and lower ends open to an interior of the cleaning vessel near the wafer and to the exhaust duct, respectively. The second exhaust may include a tapered exhaust guide pipe surrounding the first exhaust guide pipe or a plurality of exhaust guide pipes disposed circumferentially uniformly around the first exhaust guide pipe.

REFERENCES:
patent: 3097450 (1963-07-01), Freeman et al.
patent: 4649672 (1987-03-01), Thomann
patent: 4723378 (1988-02-01), Van Kuiken et al.
patent: 4932168 (1990-06-01), Tada et al.
patent: 4974375 (1990-12-01), Tada et al.

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