Cleaning device for a plasma etching system

Electric heating – Metal heating – By arc

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219121PG, 219407, 156643, 204210, B23K 900

Patent

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044305478

ABSTRACT:
A cleaning apparatus for a plasma etching system for etching a sample which includes a chamber having an inlet and an outlet, a sample table positioned in the chamber and which further includes a first electrode, a counter electrode positioned in the chamber opposite the first electrode and a plurality of heating mechanisms positioned in the inlet and outlet of the chamber, in the counter electrode and in the sample table for desorbing a reaction product adsorbed on surfaces of the inlet and outlet of the chamber, the counter electrode and the sample table prior to plasma etching of the sample.

REFERENCES:
patent: 3866017 (1975-02-01), Keren et al.
patent: 4292384 (1981-09-01), Straughan et al.
IBM Technical Bulletin, vol. 22, No. 9, 2--1980.
Solid State Technology, May 1976, vol. 19, H.5, S. 31-36.
Solid State Technology, Dec. 1975, Bd. 18, H. 12, S. 25-33.
Solid State Technology, Apr. 1980, S. 157-158.
Solid State Technology, Apr. 1979, S. 139-142.

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