Cleaning device for a plasma etching system

Details Cleaning device for a plasma etching system Cleaning device for a plasma etching system

1981-10-06

1984-02-07

Paschall, M. H.

Electric heating

Metal heating

By arc

219121PG, 219407, 156643, 204210, B23K 900

Patent

active

044305478

ABSTRACT:
A cleaning apparatus for a plasma etching system for etching a sample which includes a chamber having an inlet and an outlet, a sample table positioned in the chamber and which further includes a first electrode, a counter electrode positioned in the chamber opposite the first electrode and a plurality of heating mechanisms positioned in the inlet and outlet of the chamber, in the counter electrode and in the sample table for desorbing a reaction product adsorbed on surfaces of the inlet and outlet of the chamber, the counter electrode and the sample table prior to plasma etching of the sample.

REFERENCES:
patent: 3866017 (1975-02-01), Keren et al.
patent: 4292384 (1981-09-01), Straughan et al.
IBM Technical Bulletin, vol. 22, No. 9, 2--1980.
Solid State Technology, May 1976, vol. 19, H.5, S. 31-36.
Solid State Technology, Dec. 1975, Bd. 18, H. 12, S. 25-33.
Solid State Technology, Apr. 1980, S. 157-158.
Solid State Technology, Apr. 1979, S. 139-142.

Affiliated with

Also associated with

Rating

Cleaning device for a plasma etching system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning device for a plasma etching system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning device for a plasma etching system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2163264