Cleaning cup system for chemical mechanical planarization...

Cleaning and liquid contact with solids – Apparatus – With spray or jet supplying and/or applying means

Reexamination Certificate

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Reexamination Certificate

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07913705

ABSTRACT:
The present invention is related to an improved cleaning cup arrangement for CMP systems that efficiently and effectively removes most, if not all, of any slurry material present on the abrasive conditioning disk and conditioner head as they are resting in the cup between conditioning cycles. The cleaning cup of the present invention includes an underside water knife for directing a high velocity stream of cleaning fluid against the rotating abrasive disk (or conditioning brush, which may be used instead of a disk) surface, and at least a pair of spray stems for directing columns of cleaning fluid with sufficient cleaning force against all exposed portions of the conditioner head.

REFERENCES:
patent: 4934393 (1990-06-01), Lighthall et al.
patent: 5505220 (1996-04-01), Gorecki
patent: 6217430 (2001-04-01), Koga et al.
patent: 6358124 (2002-03-01), Koga et al.
patent: 6481446 (2002-11-01), Yang et al.
patent: 6554688 (2003-04-01), Lacy
patent: 6899601 (2005-05-01), Boyd
patent: 6942223 (2005-09-01), Bleijenberg et al.
patent: 7025663 (2006-04-01), Kim
patent: 7108579 (2006-09-01), Wada et al.
patent: 2001/0041517 (2001-11-01), Manfredi
patent: 2002/0038803 (2002-04-01), Malcolm
patent: 2003/0010671 (2003-01-01), Orii et al.
patent: 2003/0015215 (2003-01-01), Hsu et al.
patent: 2003/0216112 (2003-11-01), Gotze et al.
patent: 2005/0048880 (2005-03-01), Tolles et al.

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