Cleaning compositions for removing organic deposits in hard...

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – Liquid composition

Reexamination Certificate

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C510S101000, C510S109000, C510S201000, C510S365000

Reexamination Certificate

active

07625855

ABSTRACT:
A cleaning composition for removing organic deposits from hard to reach surfaces. In its basic embodiment, the cleaning composition comprises: a) a water miscible solvent; b) an inorganic salt in crystal form; and c) water. The inorganic salt in crystal form comprises from about 30 to about 70% weight of the total composition.

REFERENCES:
patent: 3981826 (1976-09-01), Munro
patent: 4056599 (1977-11-01), Fox et al.
patent: 4179414 (1979-12-01), Clayton
patent: 4268405 (1981-05-01), Herrick et al.
patent: 4362640 (1982-12-01), Schreiber
patent: 4528180 (1985-07-01), Schaeffer
patent: 4652375 (1987-03-01), Heilweil et al.
patent: 4749562 (1988-06-01), Lane et al.
patent: 4879042 (1989-11-01), Hanson et al.
patent: 5330618 (1994-07-01), Daniels et al.
patent: 5354493 (1994-10-01), Wilms
patent: 5470499 (1995-11-01), Choy et al.
patent: 5480574 (1996-01-01), Singerman
patent: 5605677 (1997-02-01), Schumann et al.
patent: 6284056 (2001-09-01), Gonzalez
patent: 6387870 (2002-05-01), Klaers et al.
patent: 6780228 (2004-08-01), Mason et al.

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