Cleaning compositions for removing etching residue and method of

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...

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Details

510178, 510434, 510489, 510499, 510245, 510254, C11D 330, C11D 320, C11D 343

Patent

active

061402877

ABSTRACT:
An etching residue remover for cleaning etching residue from a substrate, derived from a mixture of at least hydroxylamine, an alkanolamine which is miscible with said hydroxylamine, water, and, optionally, a chelating agent, wherein the hydroxylamine and the alkanolamine are present in amounts sufficient to clean etching residue from the substrate.

REFERENCES:
patent: Re30714 (1981-08-01), Harriman et al.
patent: Re30796 (1981-11-01), Lesinski
patent: 3160539 (1964-12-01), Hall et al.
patent: 3530186 (1970-09-01), Greco
patent: 3582401 (1971-06-01), Berrilla et al.
patent: 3649395 (1972-03-01), Lee
patent: 3753933 (1973-08-01), Olstowski et al.
patent: 3972839 (1976-08-01), Murphy
patent: 4067690 (1978-01-01), Cuisia et al.
patent: 4111767 (1978-09-01), Kawagishi et al.
patent: 4155866 (1979-05-01), Berkenblit et al.
patent: 4165294 (1979-08-01), Vander Mey
patent: 4187140 (1980-02-01), Berkenblit et al.
patent: 4221674 (1980-09-01), Vander Mey
patent: 4238275 (1980-12-01), Shih
patent: 4264716 (1981-04-01), Vincent et al.
patent: 4268406 (1981-05-01), O'Brien et al.
patent: 4276185 (1981-06-01), Martin
patent: 4278635 (1981-07-01), Kerst
patent: 4279870 (1981-07-01), Natansohn et al.
patent: 4282111 (1981-08-01), Ciuba
patent: 4284435 (1981-08-01), Fox
patent: 4289091 (1981-09-01), Muccitelli
patent: 4350606 (1982-09-01), Cuisia et al.
patent: 4425380 (1984-01-01), Nuzzi et al.
patent: 4482626 (1984-11-01), Twist et al.
patent: 4539230 (1985-09-01), Shimizu et al.
patent: 4549968 (1985-10-01), Muccitelli
patent: 4595519 (1986-06-01), Takeno et al.
patent: 4617251 (1986-10-01), Sizensky
patent: 4626411 (1986-12-01), Nemes et al.
patent: 4699868 (1987-10-01), Sabongi
patent: 4732887 (1988-03-01), Obanawa et al.
patent: 4737195 (1988-04-01), Carandang et al.
patent: 4786578 (1988-11-01), Neisius et al.
patent: 4824763 (1989-04-01), Lee
patent: 4824949 (1989-04-01), Lee
patent: 4834912 (1989-05-01), Hodgens et al.
patent: 4861386 (1989-08-01), Hoy
patent: 4873136 (1989-10-01), Foust et al.
patent: 4895703 (1990-01-01), Zupanovich et al.
patent: 4929301 (1990-05-01), Beechko
patent: 4941941 (1990-07-01), Austin et al.
patent: 4980077 (1990-12-01), Morris et al.
patent: 5015298 (1991-05-01), Arrington
patent: 5022926 (1991-06-01), Kreh et al.
patent: 5049201 (1991-09-01), Cheng et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5091103 (1992-02-01), Dean et al.
patent: 5185235 (1993-02-01), Sato et al.
patent: 5279771 (1994-01-01), Lee
patent: 5288332 (1994-02-01), Pastilnik et al.
patent: 5290361 (1994-03-01), Hayashida et al.
patent: 5308745 (1994-05-01), Schwartzkopf
patent: 5334332 (1994-08-01), Lee
patent: 5407788 (1995-04-01), Fang
patent: 5672577 (1997-09-01), Lee
patent: 5902780 (1999-05-01), Lee

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