Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1998-08-13
1999-12-14
Gupta, Yogendra
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 134 39, 134 42, 510175, 510176, 510499, B08B 304, C11D 326, C11D 330, C11D 343
Patent
active
060004118
ABSTRACT:
A method of removing etching residue from a substrate by contacting a substrate having etching residue present thereon with an etching residue remover derived from a mixture of at least hydroxylamine, an alkanolamine which is miscible with the hydroxylamine, water, and, optionally, a chelating agent at a temperature and for a time sufficient to remove the etching residue from the substrate.
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Material Safety Data Sheet, Experimental Stripper, WMX-225 (1 sheet).
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"Reactions of Catechol", Crown Zellerbach Corp., Chemicals Products Division, Camas, Washington 98607 (pp. 1-33 w/Cover Sheet and Table of Contents).
Del Cotto Gregory R.
EKC Technology, Inc.
Gupta Yogendra
LandOfFree
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