Cleaning compositions for removing etching residue and method of

Details Cleaning compositions for removing etching residue and method of Cleaning compositions for removing etching residue and method of

1997-01-28

1999-05-11

Lieberman, Paul

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

134 2, 134 38, 134 40, 510108, 510175, 510245, 510254, 510401, 510402, 510405, 510434, 510489, 510492, 510499, 510505, C11D3/20;3/26;3/30

Patent

active

059027800

ABSTRACT:
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.

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