Compositions – Fluent dielectric – N-containing
Patent
1992-07-09
1994-08-02
Lieberman, Paul
Compositions
Fluent dielectric
N-containing
252DIG11, 134 2, 134 40, C11D 330, C11D 333
Patent
active
053343328
ABSTRACT:
A stripping and cleaning composition for removing resists and etching residue from substrates containing hydroxylamine and at least one alkanolamine is described. Further, a cleaning composition for removing etching residue from semiconductor substrates containing hydroxylamine, at least one alkanolamine, at least one chelating agent, and water is described. The preferred chelating agent is 1,2-dihydroxybenzene or a derivative thereof. The chelating agent provides added stability and effectiveness to the cleaning composition.
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EKC Technology, Inc.
Higgins Erin
Lieberman Paul
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