Cleaning compositions

Details Cleaning compositions Cleaning compositions

2005-02-08

2005-02-08

Del Cotto, Gregory R. (Department: 1751)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S039000, C134S040000, C510S175000, C510S176000, C510S245000, C510S255000, C510S257000, C510S254000, C510S264000, C510S499000, C510S477000, C510S488000, C510S504000

Reexamination Certificate

active

06851432

ABSTRACT:
An aqueous cleaning composition comprising an alkanolamine, a tetraalkylammonium hydroxide, nonmetallic fluoride salt, a corrosion inhibitor, e.g. ascorbic acid or its derivatives alone or in combination, balance water. Such cleaning compositions are effective to remove residues from plasma process generated organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures with little corrosion of copper and attack of dielectric substrates.

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