Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
1999-08-27
2001-11-06
Kopec, Mark (Department: 1751)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S176000, C510S421000, C510S426000, C510S437000, C134S001200, C134S001300, C134S038000, C134S040000
Reexamination Certificate
active
06313078
ABSTRACT:
FIELD OF THE INVENTION
The present invention relates to a cleaning composition and a cleaning method using the same. More particularly, the present invention relates to an excellent cleaning composition that can remove in a short period of time deposited contaminant adhered to the interior of a resist developing apparatus which may be used for the production of electronic components or the like.
BACKGROUND OF THE INVENTION
In production of wiring, electrodes, or various components of electrical and electronic devices, a photo lithography technique is widely used to transfer a desired pattern to a thin resist film on a substrate or board.
Recently, with the higher integration of substrate circuits, the need for higher resolution resist has increased. However, since high resolution resist usually includes a highly hydrophobic photo initiator, such photo initiator insoluble in alkaline solution is prone to precipitate and adhere to a resist developing apparatus. An operation of a resist developing apparatus in the presence of such precipitates, or deposited contaminant, may cause underdevelopment due to clogging of splay nozzles, or product defects such as open or short circuit. Such deposited contaminants should be removed regularly to maintain a developing efficiency and a good condition for resist developement.
Conventionally, physical cleaning methods are employed to remove deposited contaminants adhered to a resist developing apparatus. Such physical methods include scrubbing off deposited contaminants, or washing off deposited contaminants with a high pressure spray, after components of a resist developing apparatus are demounted. However, it is difficult to remove deposited contaminants in corners of a chamber or components, inside of a pipe, inside of spray nozzles and the like completely by such physical methods.
Chemical cleaning methods using a cleaning agent are also employed, without using physical cleaning methods. For example, in a method using concentrated acetic acid, a concentrated acetic acid solution is introduced to be circulated in a tank for reserving developing solution. Unlike physical cleaning methods, this chemical method does not require a step of disassembling components of a resist developing apparatus to be cleaned and makes it possible to remove contaminants in complicated portions of a resist developing apparatus. However, acetic acid is only used under carefully controlled and limited situations, since irritating smell of acetic acid exerts a bad influence on the operating condition and the environment outside an operating room, and also acetic acid is corrosive to a resist developing apparatus.
Another chemical method wherein a resist developing apparatus is cleaned stepwise with two kinds of liquid is also used, however, it is not as effective as the acetic acid method. Therefore, concentrated acetic acid is used to clean a resist developing apparatus in spite of its bad influence on the environment and a resist developing apparatus, or a substitute that is not as effective as acetic acid is used.
SUMMARY OF THE INVENTION
The present inventor made researches to solve the above problems and to provide a cleaning composition which can be used to remove deposited contaminant adhered to a resist developing apparatus and eventually achieved the present invention.
An object of the present invention is to provide a cleaning or detergent composition which is suitable to clean an electrical and electronic apparatus or device, especially a resist developing apparatus and is as efficient as acetic acid that has been regarded as the most efficient cleaning agent for such an apparatus or a device heretofore.
Another object of the present invention is to provide a cleaning composition which does not emit an irritating smell and exert a bad influence on the environment, unlike acetic acid.
Still another object of the present invention is to provide a economical cleaning composition which can be recovered after uses and used repeatedly due to its excellent dissolving ability.
Further object of the present invention is to provide a noncorrosive cleaning composition, which can reduce the time and cost needed to maintain or repair an apparatus or device.
A cleaning composition of the present invention comprises a surfactant containing a phenyl group, a sulfonated aromatic compound, and water.
A cleaning composition of the present invention may further comprise a derivative of aliphatic carboxylic acid or acetic ester, or a combination thereof.
A method of cleaning a resist developing apparatus of the present invention comprises removing deposited contaminant adhered to the inside of the resist developing apparatus with the use of a cleaning composition comprising a surfactant containing a phenyl group, a sulfonated aromatic compound, and water.
A method of cleaning a resist developing apparatus of the present invention may optionally comprise removing deposited contaminant adhered to the hard surface of the resist developing apparatus with the use of a cleaning composition comprising a surfactant containing a phenyl group, a sulfonated aromatic compound, a derivative of aliphatic carboxylic acid, acetic ester; and water.
Preferred embodiments of the present invention will be described in detail below.
REFERENCES:
patent: 3930857 (1976-01-01), Bendz et al.
patent: 4472494 (1984-09-01), Hallman et al.
patent: 4861438 (1989-08-01), Banks et al.
patent: 5753601 (1998-05-01), Ward et al.
Boyer Charles
Capella Steven
International Business Machines - Corporation
Kopec Mark
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