Cleaning composition for copper and copper alloys and method of

Compositions – Etching or brightening compositions – Inorganic acid containing

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134 3, 252 794, 252142, 156656, 156666, C09K 1304, C23G 102, B44C 122, C23F 100

Patent

active

050192884

ABSTRACT:
An acidic solution for use as a cleaning composition for copper and copper alloys includes a solution of from about 1-20 weight percent hydrochloric acid and approximately 80-99 weight percent of an aqueous hydrochloric acid-based composition which has a pH of less than about 1.0 yet is substantially non-reactive with compounds having low oxidative states, including human skin tissue.

REFERENCES:
patent: 4181622 (1980-01-01), Gavin
patent: 4199469 (1980-04-01), Walzer
patent: 4250048 (1981-02-01), Levesks
patent: 4477364 (1984-10-01), Garcia
patent: 4581102 (1986-04-01), Brock

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