Cleaning composition containing tetraalkylammonium salt and use

Details Cleaning composition containing tetraalkylammonium salt and use Cleaning composition containing tetraalkylammonium salt and use

1998-06-15

2000-04-04

Utech, Benjamin L.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

252 793, 252 794, 216 89, 216 97, 438692, 438750, 510176, C09K 1308, C09K 1306, C11D 904, B08B 600, H01L 21302

Patent

active

060448512

ABSTRACT:
A composition prepared from water, hydrofluoric acid (HF) and tetraalkylammonium hydroxide (TAAH, preferably tetramethylammonium hydroxide (TMAH)) or tetraalkylammonium fluoride and solvent with or without HF or TAAH is used to clean residue from a semiconductor wafer, where the residue is formed as a result of a planarization process, such as chemical mechanical polishing. Incorporation of TMAH into an aqueous HF composition retards the rate at which the composition dissolves borophosphosilicate (BPSG) without effecting the rate at which silica is dissolved. Thus, the aqueous HF/TMAH composition may be used to completely remove silica-containing residue from a BPSG surface, with a tolerable level of BPSG removal.

REFERENCES:
patent: 4339340 (1982-07-01), Muraoka et al.
patent: 4581101 (1986-04-01), Senoue et al.
patent: 4722883 (1988-02-01), Koibuchi et al.
patent: 4807016 (1989-02-01), Douglas
patent: 5240878 (1993-08-01), Fitzsimmons et al.
patent: 5300463 (1994-04-01), Cathey et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5354490 (1994-10-01), Yu et al.
patent: 5389194 (1995-02-01), Rostoker et al.
patent: 5407526 (1995-04-01), Danielson et al.
patent: 5448097 (1995-09-01), Mizushima et al.
patent: 5478436 (1995-12-01), Winebarger et al.
patent: 5705089 (1998-01-01), Sugihara et al.
patent: 5716535 (1998-02-01), Lee et al.
patent: 5747381 (1998-05-01), Wu et al.
patent: 5783495 (1998-07-01), Li et al.

Affiliated with

Also associated with

Rating

Cleaning composition containing tetraalkylammonium salt and use does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning composition containing tetraalkylammonium salt and use , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning composition containing tetraalkylammonium salt and use will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-356521