Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate
2004-06-10
2008-10-28
Douyon, Lorna M (Department: 1796)
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
C510S259000, C510S272000, C510S435000, C510S504000, C134S002000
Reexamination Certificate
active
07442675
ABSTRACT:
A cleaning composition comprises at least quaternary ammonium hydroxide, a water-soluble organic solvent, water, an anticorrosive, and potassium hydroxide of 1 mass percent or less of a total amount of the solution. This cleaning composition can singly and effectively remove a photoresist film, a buried material, a metallic residue from the surface of a semiconductor substrate.
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Clark Shan Christopher
Haraguchi Takayuki
Hussein Makarem A.
Jong Lana I.
Wakiya Kazumasa
Douyon Lorna M
Hoffmann & Baron , LLP
Intel Corporation
Tokyo Ohka Kogyo Co. Ltd.
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