Cleaning composition and method for using the same

Bleaching and dyeing; fluid treatment and chemical modification – Cleaning or laundering – Dry cleaning

Reexamination Certificate

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Details

C510S282000, C510S285000

Reexamination Certificate

active

06309425

ABSTRACT:

FIELD OF THE INVENTION
This invention is directed to a novel cleaning composition and method for cleaning by using the same. More particularly, the invention is directed to a dry cleaning composition and a method for dry cleaning that employ a stain removal composition. The stain removal composition comprises a surfactant, and when contacted with a contaminated substrate, unexpectedly results in the elimination of substantially all contaminants without requiring the use of a displacing gas.
BACKGROUND OF THE INVENTION
In many cleaning applications, it is desirable to remove contaminants (e.g., stains) from substrates, like metal, ceramic, polymeric, composite, glass and textile comprising substrates. Particularly, it is highly desirable to remove contaminants from clothing whereby such contaminants include dirt, salts, food stains, oils, greases and the like.
Typically, dry cleaning systems use organic solvents, like chlorofluorocarbons, perchloroethylene, and branched hydrocarbons to remove contaminants from substrates. In response to environmental concerns, however, other dry cleaning systems have been developed that use inorganic solvents, such as densified carbon dioxide, to remove contaminants from substrates. The systems that use organic or inorganic solvents to remove contaminants from substrates generally employ a surfactant and a polar solvent so that a reverse-micelle may be formed to trap the contaminant targeted for removal.
Regardless of the type of solvents and surfactants employed, it is often very difficult to remove contaminants from substrates. This is true because contaminants often are chemically attracted to (e.g., dipole-dipole interactions, van der Waals forces) or become entangled with the substrate they are associated with. In fact, many known dry cleaning processes typically do not display superior cleaning results.
It is of increasing interest to develop compositions and methods that can be used to remove substantially all contaminants from substrates. This invention, therefore, is directed to a superior dry cleaning composition and method for dry cleaning that unexpectedly result in a substrate substantially free of contaminants (e.g., an SRI of at least about 64.0 as defined below) after cleaning and without the need to employ a displacing gas. Also, it is not required in this invention to use additives in the stain removal composition of the dry cleaning composition that are soluble in a continuous phase. Particularly, it is not required in this invention to employ a stain removal surfactant or an anti-redeposition agent, or both that is/are soluble in the continuous phase (as defined below).
BACKGROUND REFERENCES
Efforts have been disclosed for dry cleaning garments. In U.S. Pat. No. 5,683,977, a dry cleaning system using densified carbon dioxide and a surfactant adjunct is disclosed.
Other efforts have been disclosed for cleaning cloths. In U.S. Pat. No. 5,747,442, stick pretreater compositions containing hydrophobically modified polar polymers are disclosed whereby the stick pretreater compositions act as prewash stain removers in aqueous laundry systems.
Still further, other attempts have been made to clean fabrics. In U.S. Pat. No. 5,820,637, a method for pretreating fabrics with a composition substantially free of anionic surfactants is disclosed.
SUMMARY OF THE INVENTION
In a first embodiment, the present invention is directed to a stain removal composition for dry cleaning applications in a solvent that is a gas at standard temperature and pressure, a biodegradable functionalized hydrocarbon or a silicone comprising solvent wherein the stain removal composition comprises a stain removal surfactant.
In a second embodiment, the present invention is directed to a stain removal composition for dry cleaning applications in a solvent which is a gas at standard temperature and pressure, a biodegradable functionalized hydrocarbon or a silicone comprising solvent, the stain removal composition comprising:
(a) a stain removal surfactant; and
(b) optionally, a stain removal solvent.
In a third embodiment, the present invention is directed to a dry cleaning composition comprising:
(a) at least one solvent selected from the group consisting of a solvent that is a gas at standard temperature and pressure, a biodegradable functionalized hydrocarbon or a silicone comprising solvent;
(b) optionally, a polar fluid;
(c) a substrate treated with a stain removal composition comprising at least one stain removal surfactant, the stain removal surfactant being a nonionic, anionic, cationic, amphoteric or zwitterionic compound or mixture thereof; and
(d) optionally, a continuous phase surfactant, the continuous phase surfactant capable of forming a reverse micelle in a continuous phase formed by the solvent.
In a fourth embodiment, the present invention is directed to a process of dry cleaning in a solvent, which is a gas at standard temperature and pressure, a biodegradable functionalized hydrocarbon or a silicone comprising solvent, using the stain removing composition described above.
In a fifth embodiment, the present invention is directed to a substrate having been subjected to the dry cleaning process of this invention.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
There generally is no limitation with respect to the solvent (i.e., fluid) employed in this invention other than that the solvent is a gas at standard temperature and pressure, a biodegradable hydrocarbon or a silicone comprising solvent, and capable of being a continuous phase in a dry cleaning application. Illustrative examples of the types of solvents which may be employed in this invention include a C
2
-C
4
substituted or unsubstituted alkane, carbon dioxide, silicone oil, and an azeotropic solvent.
Regarding the solvent which is a gas at standard temperature and pressure, such a solvent may be, within the dry cleaning composition or process, a gas, liquid or supercritical fluid depending upon how densified the solvent is (how much pressure is applied at a given temperature) in the domestic or commercial cleaning application the solvent is used in. Propane and carbon dioxide tend to be the preferred solvents when the solvent selected is one which is a gas at standard temperature and pressure. Carbon dioxide, however, is especially preferred.
As to the silicone comprising solvent which may be used in this invention, such a solvent is typically a commercially available cyclic-siloxane based solvent made available from GreenEarth Cleaning, LLC. Such a solvent is generally one which has a flash point over about 65° C., with octamethyl-cyclotetrasiloxane and decomethyl-cyclopentasiloxane being most preferred. A more detailed description of such conventional siloxane comprising solvents may be found in U.S. Pat. No. 5,942,007, the disclosure of which is incorporated herein by reference.
The biodegradable functionalized hydrocarbon that may be used in this invention includes those generally classified as an azeotropic solvent. Such an azeotropic solvent often comprises alkylene glycol alkyl ethers, like propylene glycol tertiary-butyl ether, and is described in U.S. Pat. No. 5,888,250, the disclosure of which is incorporated herein by reference. Moreover, as used herein, biodegradable functionalized hydrocarbon is defined to mean a biodegradable hydrocarbon comprising at least one member selected from the group consisting of an aldehyde, ketone, alcohol, alkoxy, ester, ether, amine, amide and sulfur comprising group.
Regarding the stain removal composition of this invention, such a composition comprises a stain removal surfactant that may generally be classified as a nonionic, anionic, cationic, amphoteric or zwitterionic compound. The stain removal surfactant which may be used in the stain removal composition of this invention is limited only to the extent that it minimizes the impact of the forces and interactions between the contaminant targeted for removal and the substrate. In addition to minimizing such forces and interactions, it is preferred that the surfactant employed in the stain re

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