Cleaning composition and method

Details Cleaning composition and method Cleaning composition and method

2008-04-08

2008-04-08

Webb, Gregory (Department: 1796)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C134S001300, C438S692000

Reexamination Certificate

active

11203377

ABSTRACT:
Cleaning compositions composed of specific amounts of carbonic acid and/or carbonate, hydrogen peroxide, aluminum fluoride and water are highly effective for cleaning electronic devices of resist, resist residues, titanium dioxide, aluminum oxide and silicon dioxide. The compositions contain no hydroxylamine and are thus free of its hazards.

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