Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2011-04-05
2011-04-05
Webb, Gregory E (Department: 1761)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C510S175000
Reexamination Certificate
active
07918941
ABSTRACT:
The present invention relates to a cleaning agent composition for use in cleaning a substrate for recording media, a substrate for photomask, or a substrate for flat panel display, a surface of which at least contains a metallic or glassy substrate moiety, the cleaning agent composition containing (I) a copolymer compound satisfying at least the following (i) to (iii): (i) a constituting unit A1 derived from acrylic acid is contained in an amount of 20% by mol or more of the entire constituting units; (ii) the constituting unit A1 derived from acrylic acid and a constituting A2 derived from 2-acrylamide-2-methylpropanesulfonic acid are contained in a total amount of 90% by mol or more of the entire constituting units; and (iii) the constituting unit A1 and the constituting unit A2 of the entire constituting units are in a content ratio [constituting unit A1 (% by mol)/constituting unit A2 (% by mol)] of from 91/9 to 95/5.
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Office Action mailed Jun. 23, 2010 in Chinese application No. 200780008708.X.
Horio Yasunori
Tamura Atsushi
Birch & Stewart Kolasch & Birch, LLP
Kao Corporation
Webb Gregory E
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