Cleaning composition

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Reexamination Certificate

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Details

C510S175000

Reexamination Certificate

active

07918941

ABSTRACT:
The present invention relates to a cleaning agent composition for use in cleaning a substrate for recording media, a substrate for photomask, or a substrate for flat panel display, a surface of which at least contains a metallic or glassy substrate moiety, the cleaning agent composition containing (I) a copolymer compound satisfying at least the following (i) to (iii): (i) a constituting unit A1 derived from acrylic acid is contained in an amount of 20% by mol or more of the entire constituting units; (ii) the constituting unit A1 derived from acrylic acid and a constituting A2 derived from 2-acrylamide-2-methylpropanesulfonic acid are contained in a total amount of 90% by mol or more of the entire constituting units; and (iii) the constituting unit A1 and the constituting unit A2 of the entire constituting units are in a content ratio [constituting unit A1 (% by mol)/constituting unit A2 (% by mol)] of from 91/9 to 95/5.

REFERENCES:
patent: 6440856 (2002-08-01), Bessho et al.
patent: 2003/0158059 (2003-08-01), Sakai et al.
patent: 2005/0202994 (2005-09-01), Baum et al.
patent: 2006/0046949 (2006-03-01), Ito et al.
patent: 5-43897 (1993-02-01), None
patent: 9-3677 (1997-01-01), None
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patent: 11-116984 (1999-04-01), None
patent: 11-181494 (1999-07-01), None
patent: 2001-64679 (2001-03-01), None
patent: 2002-69495 (2002-03-01), None
patent: 2006-60243 (2006-03-01), None
Office Action mailed Jun. 23, 2010 in Chinese application No. 200780008708.X.

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