Cleaning bench for removing contaminants from semiconductor...

Details Cleaning bench for removing contaminants from semiconductor... Cleaning bench for removing contaminants from semiconductor...

2008-09-23

2008-09-23

Stinson, Frankie L (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S06400P, C134S076000

Reexamination Certificate

active

12069836

ABSTRACT:
Described are cleaning benches and methods for removing contaminant layers from semiconductor process components using small volumes of hazardous liquids and minimizing cross-contamination between components from different deposition chambers. Components to be cleaned are stored within or supported by a dedicated cassette before they are placed in a receptacle of cleaning liquid. The cassette displaces a significant percentage of the receptacle's volume; consequently, only a relatively small volume of cleaning liquid is needed to fully submerge the component. In typical embodiments, the combined cassette and component displace a volume of liquid that is greater than the volume of liquid used to clean the component. The cleaning bench can include different chemical baths for different components. Cassettes dedicated for use with particular components can be keyed to particular receptacles.

REFERENCES:
patent: 16190 (1856-12-01), Roland
patent: 17066 (1857-04-01), Morrow
patent: 30331 (1860-10-01), Lanham
patent: 53052 (1866-03-01), Smith
patent: 617405 (1899-01-01), Pett
patent: 847129 (1907-03-01), Sunkle
patent: 1141314 (1915-06-01), Caldwell
patent: 1202154 (1916-10-01), Blakeslee
patent: 2036261 (1936-04-01), Dinley
patent: 2191508 (1940-02-01), Stuart
patent: 2416475 (1947-02-01), Friedman
patent: 2860646 (1958-11-01), Zucker
patent: 2988012 (1961-06-01), Markley et al.
patent: 3010460 (1961-11-01), Leppeau
patent: 3077155 (1963-02-01), Maddock et al.
patent: 3121438 (1964-02-01), Kennedy
patent: 3151620 (1964-10-01), Kellard
patent: 3680266 (1972-08-01), Shiplov
patent: 3952756 (1976-04-01), Sheppard
patent: 4302273 (1981-11-01), Howard, Jr.
patent: 4305413 (1981-12-01), Dougherty
patent: 4520834 (1985-06-01), DiCicco
patent: 4550579 (1985-11-01), Clifford
patent: 4654910 (1987-04-01), Kusuki et al.
patent: 4778559 (1988-10-01), McNeilly
patent: 4965904 (1990-10-01), Tanaka et al.
patent: 5014727 (1991-05-01), Aigo
patent: 5088609 (1992-02-01), Fryc
patent: 5580300 (1996-12-01), Tsutsumi
patent: 5660640 (1997-08-01), Laube
patent: 5697391 (1997-12-01), Segawa
patent: 5707457 (1998-01-01), Yates
patent: 5851307 (1998-12-01), Gilmer et al.
patent: 5906216 (1999-05-01), Barlet
patent: 5933902 (1999-08-01), Frey
patent: 6048405 (2000-04-01), Skrovan et al.
patent: 6055694 (2000-05-01), Steere
patent: 6217415 (2001-04-01), Ajayi
patent: 6253775 (2001-07-01), Kitahara et al.
patent: 6530388 (2003-03-01), Zuck et al.
patent: 6637444 (2003-10-01), Zuck et al.
patent: 6926016 (2005-08-01), Zuck et al.
patent: 7328712 (2008-02-01), Zuck et al.
patent: 31 29 699 (1983-02-01), None
patent: 8-66451 (1966-03-01), None
patent: 8-66453 (1966-03-01), None
patent: 53-136358 (1978-11-01), None
patent: 58-109159 (1983-06-01), None
patent: 1-263287 (1989-10-01), None
patent: 3-124028 (1991-05-01), None
patent: 3-246940 (1991-11-01), None
patent: 5-102121 (1993-04-01), None
patent: 5-152273 (1993-06-01), None
patent: 6-271068 (1994-08-01), None
patent: 9-66190 (1997-03-01), None
patent: 2002051405 (2000-12-01), None
“Aqueous/Semi-Aqueous Ultrasonic Cleaning System,” Bulletin S-1029, Branson Ultrasonics Corporation (1994). 2 pages.
“Aqueous Ultrasonic Cleaning System,” Bulletin S-1015, Branson Ultrasonics Corporation (1992).
“Aqueous Ultrasonic Cleaning System,” Bulletin S-1024A, Branson Ultrasonics Corporation (1993). 2 pages.
“Aqueous Ultrasonic Cleaning System,” Bulletin S-1014, Branson Ultrasonics Corporation (1992). 2 pages.
“Microclean Ultrasonic Cleaning Systems, PE Series Cleaning Processes for Precision Engineering Industries,” Kerry Ultrasonics Limited (1993). 6 pages.
“Microsolve Ultrasonic Cleaning Systems, Solvent Processes for Precision Cleaning,” Kerry Ultrasonics Limited (not dated; obtained in 1999). 6 pages.
“PA-Series™ Aqueous Precision Cleaning Systems,” Forward Technology Industries, Inc. (1999). 4 pages.
“SA-Series™ Solvent Precision Cleaning Systems,” Forward Technology Industries, Inc. (1999). 4 pages.
“SVG Polyimide Parts Cleaner, Maintenance and Operation Manual,” Poly-Flow Engineering, Inc. (1994). 35 pages.
“Endura® PVD Process Kit Catalog,” revision C, Applied Materials, Inc. (Oct. 1993). 40 pages.
U.S. Appl. No. 10/622,393, filed Jul. 18, 2003, Zuck et al.
“Electric Immersion Heaters, Heat Exchangers, In-Line Heaters, and Level and Temperature Controls,” available from Process Technology of Mentor, Ohio (obtained in 1999). 35 pages.
ESCA Sales Brochure, undated document received Sep. 15, 1999. 17 pages.
“S2-93A Compliance Statement,” reference document Ref113, Universal Plastics (1999). 8 pages.
“Products & People . . . Creating Value Through Excellence & Innovation,” Universal Plastics, Inc., (undated reference obtained in 1999). 21 pages.
“Safety Design in Parts Cleaning,” Poly-Flow Engineering, Inc. (not dated, obtained in 1999). 15 pages.

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