Cleaning apparatus of semiconductor device

Details Cleaning apparatus of semiconductor device Cleaning apparatus of semiconductor device

1997-08-13

1998-12-22

Warden, Jill

Cleaning and liquid contact with solids

Apparatus

Plural, separate, work treating or holding receptacles or...

134198, 134902, 239558, B05B 114, B08B 302, B08B 304

Patent

active

058508414

ABSTRACT:
A nozzle for spraying a cleaning solution, a body of the nozzle having its intake at one end, its sealed end portion at the other end, and a plurality of holes arranged linearly on its surface form inside of the body to outside of the body are disclosed. Also disclosed is a cleaning apparatus of a semiconductor device which includes a bath where wafers are cleaned and a cleaning solution spraying nozzle mounted at the bottom of the bath for spraying a cleaning solution through a plurality of holes formed on its surface, with the nozzle's one side being connected to a cleaning solution supply tube and the nozzle's other side being sealed. The hole's area through which the solution passes gradually decreases from one side of the nozzle through which the cleaning solution is induced, to the other side sealed so that the solution is sprayed with a uniform pressure.

REFERENCES:
patent: 1971376 (1934-08-01), Hunt et al.
patent: 2755851 (1956-07-01), Dow et al.
patent: 3567120 (1971-03-01), Suda
patent: 5292373 (1994-03-01), Arita et al.
patent: 5540247 (1996-07-01), Kawatani et al.

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