Cleaning apparatus for substrate

Details Cleaning apparatus for substrate Cleaning apparatus for substrate

1991-06-24

1993-04-20

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134902, 134151, 134122R, B08B 910

Patent

active

052037983

ABSTRACT:
A cleaning apparatus capable of substantially complete removal of contaminations generated during the manufacturing process of glass substrates, semiconductor wafers, magnetic disk substrates, magnetic head substrates or the like. The cleaning apparatus comprises a cleaning bath which is greater in cross section than the material to be cleaned and which has an opening portion for insertion of the material to be cleaned, and an ultrasonic transducer attached to the cleaning bath. The apparatus precludes various defects arising from contaminations, and enhances reliability and yield of the substrates manufactured.

REFERENCES:
patent: 4082565 (1978-04-01), Sjolander
patent: 4475259 (1984-10-01), Ishii et al.
patent: 4652106 (1987-03-01), Jurgensen et al.
patent: 4728368 (1988-03-01), Pedziwiatr
patent: 4806277 (1989-02-01), Sakurai et al.
patent: 4854337 (1989-08-01), Bunkenburg
patent: 4902350 (1990-02-01), Steck
patent: 5017236 (1991-05-01), Moxress et al.
patent: 5038808 (1991-08-01), Hammond et al.
patent: 5090430 (1992-02-01), Nixon

Affiliated with

Also associated with

Rating

Cleaning apparatus for substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning apparatus for substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning apparatus for substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1522582