Cleaning apparatus for cleaning substrates

Details Cleaning apparatus for cleaning substrates Cleaning apparatus for cleaning substrates

1996-01-17

1997-07-29

Spisich, Mark

Brushing, scrubbing, and general cleaning

Machines

With air blast or suction

15 77, 15 882, 134902, H01L 21304

Patent

active

056511604

ABSTRACT:
The cleaning apparatus for cleaning a semiconductor wafer W as a substrate, has a holding mechanism for holding the wafer, a motor for rotating the wafer held by the holding mechanism, and a cleaning section provided on at least one side of the wafer held by the holding mechanism. The cleaning section includes at least one cleaning member provided so as to be brought into contact with the wafer W, and the cleaning member is movable along with the rotation of the substrate rotated by the motor while it is in contact with the wafer.

REFERENCES:
patent: 2296156 (1942-09-01), Fuller
patent: 3803660 (1974-04-01), Jividen et al.
patent: 4068251 (1978-01-01), Schroter et al.
patent: 4935981 (1990-06-01), Ohtani et al.
patent: 5144711 (1992-09-01), Gill, Jr.
patent: 5345639 (1994-09-01), Tanoue et al.
patent: 5351360 (1994-10-01), Suzuki et al.
patent: 5361449 (1994-11-01), Akimoto
patent: 5375291 (1994-12-01), Tateyama et al.
patent: 5485644 (1996-01-01), Shinbara et al.

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