Cleaning apparatus for cleaning a semiconductor wafer

Details Cleaning apparatus for cleaning a semiconductor wafer Cleaning apparatus for cleaning a semiconductor wafer

1996-02-06

1998-09-15

Moore, Chris K.

Brushing, scrubbing, and general cleaning

Machines

With air blast or suction

153092, 15345, B08B 502, B08B 504

Patent

active

058061380

ABSTRACT:
A semiconductor cleaning apparatus for removing particles that have adhered to the back side of a semiconductor wafer. The semiconductor wafer is placed on a support. Inert gas is blown against the back of the semiconductor wafer by a plurality of nozzles, each of which is positioned at a predetermined angle to the back of the semiconductor wafer and inclined in a first direction. An air exhaust is located near the periphery of the semiconductor wafer and arranged so as to suck in the particles removed from the semiconductor wafer with the nozzles.

REFERENCES:
patent: 3775806 (1973-12-01), Olbrant et al.
patent: 3939526 (1976-02-01), Mania et al.
patent: 4395793 (1983-08-01), Wedel et al.
patent: 4541141 (1985-09-01), Le Goff
patent: 4727614 (1988-03-01), Swistun
patent: 4854004 (1989-08-01), Omata et al.
patent: 5361449 (1994-11-01), Akimoto
patent: 5375291 (1994-12-01), Tateyama et al.

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