Cleaning apparatus, coating and developing apparatus, and...

Details Cleaning apparatus, coating and developing apparatus, and... Cleaning apparatus, coating and developing apparatus, and...

2011-08-23

2011-08-23

Kornakov, Michael (Department: 1714)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S099100, C134S102100, C134S199000, C134S200000

Reexamination Certificate

active

08001983

ABSTRACT:
A wafer W is held in a horizontal attitude within an airtight container41by a vacuum chuck42such that small gaps are formed between the wafer W and the inner surfaces of the airtight container41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port40which is an end of a fluid supply path5, and is discharged through a fluid discharge portion44arranged in the bottom portion of the airtight container41in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion44.This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus4has a small size.

REFERENCES:
patent: 4544446 (1985-10-01), Cady
patent: 5882433 (1999-03-01), Ueno
patent: 6357457 (2002-03-01), Taniyama et al.
patent: 6446643 (2002-09-01), Curtis et al.
patent: 7145643 (2006-12-01), Auer-Jongepier et al.
patent: 2002/0182040 (2002-12-01), Kimura et al.
patent: 2003/0202792 (2003-10-01), Goshi
patent: 2004/0065540 (2004-04-01), Mayer et al.
patent: 2005/0026448 (2005-02-01), Engesser
patent: 2007/0047388 (2007-03-01), DeNatale et al.
patent: 5-291223 (1993-11-01), None
patent: 9-69488 (1997-03-01), None
patent: 2000-49135 (2000-02-01), None

Affiliated with

Also associated with

Rating

Cleaning apparatus, coating and developing apparatus, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning apparatus, coating and developing apparatus, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning apparatus, coating and developing apparatus, and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2690134