Cleaning apparatus and process

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

134 17, 134 21, 134 2212, 134 2218, 134 37, 137 15, 164132, B08B 902

Patent

active

050825020

ABSTRACT:
Particles adhering to the internal surfaces of an object are removed by the movement of a shock wave past the surfaces. The shock wave is generated by the explosion of a gas in a chamber located inside the object. The invention has particular application for use in cleaning process equipment.

REFERENCES:
patent: 2690960 (1954-10-01), Kistiakowsky et al.
patent: 2714563 (1955-08-01), Poorman et al.
patent: 2752272 (1956-06-01), Fay
patent: 2839435 (1958-06-01), Boswell
patent: 3364983 (1968-01-01), Krinov et al.
patent: 3910494 (1975-10-01), Melton, Jr.
patent: 4089702 (1978-05-01), Enoksson et al.
patent: 4120699 (1978-10-01), Kennedy, Jr. et al.
patent: 4461651 (1984-07-01), Hall
patent: 4642611 (1987-02-01), Koerner
patent: 4645542 (1987-02-01), Scharton et al.
patent: 4655846 (1987-05-01), Scharton et al.
patent: 4699665 (1987-10-01), Scharton et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Cleaning apparatus and process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Cleaning apparatus and process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Cleaning apparatus and process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-113465

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.